Intel is adopting ASML’s next-generation High-NA lithography tool to support the production of its laptop chips, according to reports. Rather than using the system for every feature on a chip, Intel applies the High-NA tool for specific layers, where the advanced resolution and performance can help improve patterning. The company also intends to use the tool to generate process data and refine how the equipment is configured and run. That data-driven approach is designed to help optimize manufacturing parameters and improve yields or quality for those targeted layers. ASML and Intel are therefore positioned as collaborating not only on the lithography capability itself, but also on learning how best to use the advanced system for Intel’s production needs. The reporting indicates the effort focuses on leveraging High-NA for select production steps and using the resulting operational data to enhance equipment performance and process optimization.